“Parallel: Erwin Olaf” presents nearly fifty photographs from the dynamic career of renowned Dutch photographer Erwin Olaf, covering the recent 15 years of his creative work. A number of the works will be shown in China for the first time. The year 2019 marks a significant moment in Olaf’s career, one of the most important and influential photographers at work in the Netherlands today. “Parallel: Erwin Olaf” is one of several major exhibition events that will take place through 2019 to celebrate his career as he turns 60, the others being at the Gemeentemuseum in The Hague, and The Hague Museum of Photography. “Parallel: Erwin Olaf” opens at SCoP on 3 March 2019, coinciding with the Shanghai Art Weekend that is held ahead of the Art Basel Hong Kong fair, as a major event on the international art calendar.